aei.dempa.net/archives/1131

Preview meta tags from the aei.dempa.net website.

Linked Hostnames

3

Thumbnail

Search Engine Appearance

Google

https://aei.dempa.net/archives/1131

Tokyo Electron to Introduce Coater/Developer in imec-ASML EUV Lab | AEI

Tokyo Electron Limited will introduce its coater/developer to the imec-ASML joint high numerical aperture (NA) extreme ultraviolet lithography (EUV) research laboratory (high NA lab) in the Netherlands. The equipment will be integrated inline with ASML’s EXE:5000 next-generation high NA EUV lithography system with a 0.55 numerical aperture, which is scheduled to be put to operation



Bing

Tokyo Electron to Introduce Coater/Developer in imec-ASML EUV Lab | AEI

https://aei.dempa.net/archives/1131

Tokyo Electron Limited will introduce its coater/developer to the imec-ASML joint high numerical aperture (NA) extreme ultraviolet lithography (EUV) research laboratory (high NA lab) in the Netherlands. The equipment will be integrated inline with ASML’s EXE:5000 next-generation high NA EUV lithography system with a 0.55 numerical aperture, which is scheduled to be put to operation



DuckDuckGo

https://aei.dempa.net/archives/1131

Tokyo Electron to Introduce Coater/Developer in imec-ASML EUV Lab | AEI

Tokyo Electron Limited will introduce its coater/developer to the imec-ASML joint high numerical aperture (NA) extreme ultraviolet lithography (EUV) research laboratory (high NA lab) in the Netherlands. The equipment will be integrated inline with ASML’s EXE:5000 next-generation high NA EUV lithography system with a 0.55 numerical aperture, which is scheduled to be put to operation

  • General Meta Tags

    14
    • title
      Tokyo Electron to Introduce Coater/Developer in imec-ASML EUV Lab | AEI
    • charset
      UTF-8
    • X-UA-Compatible
      IE=edge
    • sitelock-site-verification
      7524
    • viewport
      width=device-width, initial-scale=1.0, maximum-scale=1.0, user-scalable=yes

  • Open Graph Meta Tags

    10
    • US country flagog:locale
      en_US
    • og:site_name
      AEI | ASIA ELECTRONICS INDUSTRY
    • og:type
      article
    • og:title
      Tokyo Electron to Introduce Coater/Developer in imec-ASML EUV Lab | AEI
    • og:description
      Tokyo Electron Limited will introduce its coater/developer to the imec-ASML joint high numerical aperture (NA) extreme ultraviolet lithography (EUV) research laboratory (high NA lab) in the Netherlands. The equipment will be integrated inline with ASML’s EXE:5000 next-generation high NA EUV lithography system with a 0.55 numerical aperture, which is scheduled to be put to operation

  • Twitter Meta Tags

    6
    • twitter:card
      summary_large_image
    • twitter:site
      @aeidempa
    • twitter:title
      Tokyo Electron to Introduce Coater/Developer in imec-ASML EUV Lab | AEI
    • twitter:description
      Tokyo Electron Limited will introduce its coater/developer to the imec-ASML joint high numerical aperture (NA) extreme ultraviolet lithography (EUV) research laboratory (high NA lab) in the Netherlands. The equipment will be integrated inline with ASML’s EXE:5000 next-generation high NA EUV lithography system with a 0.55 numerical aperture, which is scheduled to be put to operation
    • twitter:creator
      @aeidempa

  • Link Tags

    20
    • EditURI
      https://aei.dempa.net/xmlrpc.php?rsd
    • alternate
      https://aei.dempa.net/archives/1131/feed
    • alternate
      https://aei.dempa.net/wp-json/wp/v2/posts/1131
    • alternate
      https://aei.dempa.net/wp-json/oembed/1.0/embed?url=https%3A%2F%2Faei.dempa.net%2Farchives%2F1131
    • alternate
      https://aei.dempa.net/wp-json/oembed/1.0/embed?url=https%3A%2F%2Faei.dempa.net%2Farchives%2F1131&format=xml

Links

54